The following technical papers relate to Litel products. Please review and contact us with any questions.
Measurement, Separation, and Amelioration of Transverse Scanning Synchronization Error
Writer: Yuji Yamaguchi, Ranjan Khurana, Adlai H. Smith, Venky Subramony, Calvin Chen Chii Wean, Joseph J. Bendik
Conference: SPIE 2006
Related Products: DMAP
Abnormal Patterning Analysis Using Actual Lens and Illumination Source Data
Writer: Jongkyun Hong, Jeonkyu Lee, Eunsuk Kang, Hyunjo Yang, Donggyu Yim, James Guerrero, Rob Chung
Conference: SPIE 2005
Related Products: ISI, SMI, DMAP, TMAP
A Simulation Performance Framework Using In-Situ Metrology
Writer: Joseph J. Bendik, Yuji Yamaguchi, Lyle G. Finkner, Adlai H. Smith
Conference: SPIE 2005
Related Products: ISI, DMAP, TMAP, HA-SMI
Application of In-Situ Aberration Measurements to Pattern-Specific Imaging Optimization
Writer: Steven D. Slonaker, Robert J. Chung
Conference: SPIE 2003
Related Products: ISI
Behavior of Lens Aberrations as a Function of Wavelength on KrF and ArF Lithography Scanners
Writer: Mark Terry, Ivan Lalovic, Greg Wells, Adlai Smith
Conference: SPIE 2001
Related Products: ISI
Gauging The Performance Of An In-situ Interferometer
Writer: Mark Terry, Adlai Smith, and Ken Rebitz
Conference: SPIE 2000
Related Products: ISI
Review of Photoresist Based Lens Evaluation
Writer: Joseph P. Kirk
Conference: SPIE 2000
Related Products: ISI
In-Situ Measurement of Lens Aberrations
Writer: Nigel R. Farrar, Adlai L. Smith, Dan Busath, Dennis Taitano
Conference: SPIE 2000
Related Products: ISI
Measurement of Lens Aberration by Using In-Situ Interferometer and Classification of Lens for Correct Application
Writer: Nakgeuon Seong, Geesung Yeo, Hanku Cho, Jootae Moon
Conference: SPIE 2000
Related Products: ISI
Understanding Lens Aberration and Influences to Lithographic Imaging
Writer: Bruce W. Smith and Ralph Schlief
Conference: SPIE 2000
Related Products: ISI
