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Litel Products provide independent characterization of critical photolithography subsystems including the lens, illuminator, and stage.


In-Situ Interferometer (ISI)®
Measures lens aberrations and phase error versus slit position


Source Metrology Instrument (SMI)®
Measures Illuminator Profile versus slit position


Transmission Mapper (TMAP)®
Measures lens NA and Transmission at the Exit Pupil


Distortion Mapper (DMAP)®
Measures image distortion and separates the lens and stage components


Z-Height Mapper (ZMAP)
Measures focus variation