Overview
The TMAP is a first generation tool that allows rapid measurement of lithographic tool lens characteristics using standard factory processing and metrology. With the TMAP it is possible to generate a complete description of the quality of the lithographic tool transmission and exit pupil NA verification.
The TMAP product comprises an optical component in the same form factor as a standard reticle, and a software package for analyzing the data received from an image capture tool. The optical component is used to expose images of the pupil plane on a standard wafer. These images are made through exposure and are then collected on a frame–grabbing image capture station. The images are then passed to the software for reconstruction of the transmission profile and the calculation of many Numerical Aperture system parameters.
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TMAP |
NA Capability |
NAPO max 1.37 |
Immersion Capability |
Yes |
Wavelength Capability |
Multi wavelength 248 & 193 nm |
Application |
90 nm node and below |
NA Reproducibility |
0.003 |
Transmission Reproducibility |
2.5 mλ
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Key Features |
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Features
- Resist based measurements
- Reticle design technology
- No moving or replacement parts
- One tool can be used with all OEM’s wavelengths
- Ability to be used within multi generations of OEM’s lithography tools
- Measures transmission profiles and NA
- No calibration or maintenance required
Applications
- Correct design of RET masks (OPC, PSM etc.) requires consideration of the transmission profile and NA
- Transmission variations in the pupil plane can give rise to feature imaging and placement errors
Benefits
- Enables precise scanner to scanner NA matching
- Enables diagnosis of lens transmission changes across exit pupil over time (caused by contamination or optical degradation) and their effects on lithographic performances using Litel’s Multi-Processor Analysis Characterization Engine (MPACE)
- Improved process simulation results
- Mask biasing simulation inputs
