Litel products provide full independent analyses of essential photolithography components such as the projection lens, illuminator, and stages. Understanding, controlling, and designing around this information is necessary to obtain high yields of leading edge products.

	InspecStep Interferometer (ISI)® Measures lens aberrations and phase error vs. slit position
	Source Metrology Instrument (SMI)® Measures source profile vs. slit position information
	Transmission Mapper (TMAP)™ Measures lens NA and transmission at the exit pupil of the main lens
	Distortion Mapper (DMAP)® Measures image distortion and separates the lens and stage components

All Litel Products are based on the standard reticle form factor and:

• Use resist based technology
• Have a Quick turnaround - requires less than 15 minutes of scanner overhead time, total cycle time offline less than 4 hours
• All products can be used on any OEM platform or any generation lithography tool
• Are self-referenced; require no outside standards
• Are factory calibrated; require no further calibration in the field
• Products can be used with ultra high NA and with immersion technologies